graphene production via nonoxidizing liquid exfoliation

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graphene production via nonoxidizing liquid exfoliation ( graphene-production-via-nonoxidizing-liquid-exfoliation )

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The scientific and technological objectives set out within the framework of the European Graphene Flagship 10 for large-scale production remain the development of reliable, reproducible, sustainable and safe approaches that can meet the needs of application areas. These key characteristics have a clear benefit for implementation, however, the previous literature on production approaches are predominantly lacking in these areas. 6.1 Control and characterisation of material properties There is limited information provided on the statistical methods used, if any, to ensure that the yield, layer distribution, lateral dimensions and defects mentioned are repeatable or a true representation of the production approaches large-scale capability. Material characterisation techniques (AFM, TEM, SEM, etc.) predominantly deal with miniscule sample sizes and so this is challenging. Nonetheless, it is an area that should be addressed to achieve reliable and reproducible outputs. It would also ensure that comparisons between published data for emerging production approaches can be conducted without a concern for underlying measurement bias. This limitation is, however, beginning to receive attention. Recently, Liscio et al.133 presented a thorough statistical analysis on fragmentation and size distributions due to ultrasonic exfoliation. Over 2500 GO sheets were analysed to determine sheet characteristics with confidence. Further effort is needed, both in terms of producing reliable insights on fundamental exfoliation mechanisms, and to develop standard protocols in industry. The primary focus for the last decade, particularly for top-down production, has been the search for methods which can produce high yield and industrial scale production rates. Properties such as carrier mobility vary by up to six orders of magnitude, depending on the production approach. For the present moment, at least, coverage of a broad set of applications (i.e. from high-frequency transistors to conductive inks) will require a broad range of production approaches. However, in addition to high yield and production rates, demonstrating the ability to tune material properties within individual 54

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