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In SDBS surfactant 3 - 19 7.5×10-3 21 10-12 8.3×10-5 26 0.4 <0.5 (633nm) - - - 0.56 - 3% monolayer, 40% <5layers 3-4 layers 1-2 layers 10 layers 3-10 layers mostly ~70% 5-8 layers 24% 1 layer, 44% 2 layers, 26% tri layers 44 Solvothe rmal Supercritical Fluid Selective to monolayer grap he ne High yield Long processing time Harsh conditions High pressure Two-step in NMP In forming gas In sulphate dispersant In NMP, DMF Shear assisted Ultra-sonication assisted 47 10 3.3×10-4 102 In tartaric acid 0.06 ~95% monolayer - - 94 40 0.8 90 0.9 21.5 0.11 43 17 Microwave High yield Short processing time Simple and imple me nted easily technology Difficult solvent/ grap he ne separation In Ionic liquid 0.14 95% monolayer 93 0.02 24 Vortex fluidic Simple set-up with minimal issues during the operation Very low yield In NMP - - 1 - 104 Taylor-Couette High quality graphene Simple process High quality graphene High production rate High quality graphene High quality graphene Selective to monolayer Cost effective Low yield Low yield Precise control of operating conditions required Defective graphene Expe nsive Long processing time Very processing time In NMP Jet Cavitation In IPA-water Mixer Kitchen blender With scotch tape With wedge With three roll mill In SDS In DMF 0.14 0.38 0.14.0.18 (514nm) 0.17-0.37 0.12 - 0.86 0.06 0.6-0.7 (532nm) 0.34 90% less than 5 layers 70% less than 5 layers Mainly less than 4 layers 5-8 layers - monolayer - 50% monolayer 1-3 layers 5 - 5 0.25 8 - 106 23 41 40 155 16 22 156 63 Pressure Driven High mixing shear Micro mecha ni cal cleavage Ball milling - 5.3 7.3 9.2×10-3 109 - - 2 long 50 - 90 Max- 0.075 50-75 1.5-2.5 - -PDF Image | graphene production via nonoxidizing liquid exfoliation
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