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16 Applied and Environmental Soil Science 1. Termal Evaporation Ni SiO2 Ni 25 -50-150 nm B 2. Pulsed Laser Deposition Graphite C plasma plume Ni (25 -50 - 150 nm) SiO Pulsed laser: 20 ns - 248 nm - 5 J.cm-2 a-C (2 nm) A 2. RTA Heating Ni (25 -50 - 150 nm) SiO 2 Heating 500 - 900°C in vacuum Ni particles SiO 2 Free-transfer Graphene SiO 2 2 3. Turbostratic Graphene Produced through Flash Joule Heating (FJH) Tis bottom-up approach converts carbonaceous material to turbostratic graphene using high current electric pulse dis- charges using a capacitor bank. Te carbonaceous material is compacted in a quartz tube between two electrodes which are connected to a capacitor bank circuit as shown in Figure 20. An AC-DC converter supplies a DC voltage to charge the capacitor bank. Te lamp connected parallel to the capacitor bank shows when the capacitors are fully charged. An insulated-gate bipolar transistor (stated as a power switch in Figure 19) with a custom LabView program is used to control the time of discharge. Te fash chamber is where the carbonaceous material is compressed between electrodes in a desiccator under a slight vacuum to aid in the expulsion of heteroatoms and hydrogen through the clearance between the electrodes and the quartz tube [76]. Amorphous carbon black powder is compressed be- tween electrodes in a quartz tube and subjected to a slight 3. RTA Heating a-C Ni (25 -50-150 nm) SiO 2 Heating 900°C in vacuum 4. Ni etching in FeCl3 Figure 18: Rapid thermal annealing synthesis route [69]. Atmospheric Argon Plasma 2.45 GHz Microwave Microwave Guide Quartz Tube Plasma Gas (Ar) Alumina Tube 34 mm Graphene Ar + Carbon-Containing Precursor Figure 19: Microwave plasma reactor for GSG production [75]. SiO2 Graphene Ni islands KrF laserPDF Image | State-of-the-Art Graphene Synthesis Methods
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