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3. FILM CHARACTERIZATION Figure 3.11: Sm/Ni atomic ratio in SmNiO3 thin films - Calculated from XRF measurements. ratio significantly. 3.2.2 Surface chemical composition Detailed investigation of chemical content of SNO films was done with XPS and TOF-SIMS. The films are rather homogeneous in-plane (figure 3.12) but mostly also along the z-axis as depicted in figure 3.13. Distribution of samarium is homogeneous. However, the surface region contains less nickel than the lower layers of the films, also close to interface there is an increased SIMS intensity for a nickel. The surface region is probably full of carbon and oxygen-based contaminants. Chromium is located mainly in the surface region, however, the atoms seem to have diffused or had been pressed inside the films’ structure as a result of the prevailing conditions in the high-pressure chamber. That drew limitations on the subsequent experi- ments. The silicon atoms which form the substrate are found in some quantity in the film’s volume. Interestingly there are more silicon atoms on the surface and in the vicinity of the interface at the film’s side than dispersed within the film capacity. The interface is not distinctly defined but rather there is a wide diffusion zone. XRF studies revealed that the process of annealing apart from stabilizing 72PDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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