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3. FILM CHARACTERIZATION Figure 3.15: Chromium 2p XPS envelope in sample S-42Aw. - Apart from clear presence of samarium, nickel and oxygen elements, the spectrum of annealed sample contains chromium (in red frame) and other contamination. Chromium is present in oxidated form as Cr2O3, CrO3. Small component of the spectrum corresponds to a ternary or quaternary compound. sition do not present any diffraction peaks coming from the film that would be equivalent to long-range crystallographic order. Instead, a pattern with a broad ridge around 29 and 31 degrees 2θ is evident. Those ridges are quite close to the (110)(002) and (111) Bragg reflections from the orthorhombic form of SmNiO3 compound. The three peaks that appear at about 44, 51 and 76 degrees 2θ are best described by the aluminium sample holder shifted due to its spacial position in the measurement table of diffractometer. During the deposition, the temperature of the substrate is about 600◦C which gives a thermal energy kBT equal to 0.075 eV. The thermodynamic conditions - temperature and partial oxygen pressure - are not enough to form a well-crystallized film. It does also matter whether the atmosphere is pure argon or mixed argon-oxygen. Diffraction patterns of films deposited in an argon atmosphere for 5 and 42 minutes are presented in figure 3.17. The films were further annealed. Both sam- ples present a polycrystalline film pattern with no evident crystalline texture. The 76PDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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