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250 Chapter 6 Fig. 6-6. Cathode plasma density profile examples as the orifice diameter is increased for a constant discharge current and flow rate. column plasma where an axial electric field in the collisional plasma conducts the current and plasma resistive heating is very important. A large fraction of this ohmic power deposited in the orifice plasma goes into heating of the orifice plate by ion bombardment, which contributes to the insert heating by conduction and radiation. In Type B cathodes, the orifice is shaped nearly as an aperture, and there is little local resistive heating. The plasma in the insert region is generated by ionization of the neutral gas by the discharge current flowing through the insert region into the orifice. At high cathode neutral-gas flows (and subsequent high plasma density) in this type of cathode, the insert heating is primarily by plasma electrons. At low flow rates or with large orifices, the insert is heated predominately by the ions bombarding the emitter surface. In Type C cathodes, there is little or no orifice, and the plasma couples from a collisionally dominated region upstream inside the insert directly into the nearly collisionless cathode plume region. This creates long axial density and potential gradients and may expose some of the downstream region of the insert to higher potentials and ion bombardment. Heating in this case is predominately by ion bombardment through the higher cathode sheath potential. Naturally, there is a continuous range of cathode operation that may demonstrate properties of all three cathode types. Indeed, a given cathode geometry can transition from low resistive heating in the orifice at low currents and low gas flow rates to substantial resistive heating and plasma generation at high currents and high gas flow rates. These three types of hollow cathodes willPDF Image | Fundamentals of Electric Propulsion: Ion and Hall Thrusters
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