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LIST OF FIGURES Figure Page 1.1: Moore’s Law states that the number of transistors per die will double every 18 months. The actual doubling has held relatively close to this prediction being every 24 months ....................................................................................................4 1.2: Phase diagram of carbon dioxide which includes the supercritical region............11 1.3: Surface tension of various solvents as a function of temperature..........................12 1.4: Density plot as a function of pressure for carbon dioxide at temperatures between 40 oC – 150 oC .....................................................................................................13 2.1: Custom built 316 stainless steel differential kinetics cold wall batch reactor with aluminum sample stage .......................................................................................21 2.2: Microelectronic actuated, six-loop, multi position, high pressure, UW type configuration valco valve for experimental sampling loop system (left) schematic view (right) internal view with sample loops attached.......................22 2.3: Ruthenium precursor, bis(2,2,6,6-tetramethyl-heptane-3,5-dionato)(1,5- cyclooctadiene)ruthenium(II), Ru(tmhd)2cod, used for supercritical fluid deposition kinetics study .....................................................................................24 2.4: Dissolution time of solid Ru(tmhd)2cod precursor into carbon dioxide at 75, 100, 125 oC ..................................................................................................................26 2.5: Absorbance of Ru(tmhd)2cod in n-heptane over the concentration range of 0.005 – 0.105 mg/mL. Red line is showing primary identification absorbance peak of 257 nm. Secondary identification absorbance peak of 305 nm also used ..........26 2.6: Standard curve for concentration of Ru(tmhd)2cod in n-heptane for UV absorbance of 257 nm (primary) and 305 nm (secondary). Extinction coefficients of the Beer-Lamber law for the primary and secondary absorbances are 18.71 L/g and 9.69 L/g, respectively .............................................................27 2.7: X-ray photoelectron spectroscopy sputter depth profile of a highly conformal, 83 nm thick ruthenium film deposited by SFD. Reaction conditions: 260 °C, 172 bar, 0.09 wt. % Ru(tmhd)2cod, 0.3 wt. % hydrogen, 3 minute heating...............29 2.8: X-ray photoelectron spectroscopy survey scan of a highly conformal, 83 nm thick ruthenium film deposited by SFD. Reaction conditions: 260 °C, 172 bar, 0.09 wt. % Ru(tmhd)2cod, 0.3 wt. % hydrogen, 3 minute heating..............................30 xviPDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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