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2.9: X-ray photoelectron spectroscopy ruthenium 3d orbital binding energy region of a highly conformal, 83 nm thick ruthenium film deposited by SFD. Reaction conditions: 260 °C, 172 bar, 0.09 wt. % Ru(tmhd)2cod, 0.3 wt. % hydrogen, 3 minute heating .....................................................................................................31 2.10: Field-Emission Scanning Electron Microscope top-down image of a 35 nm thick ruthenium film deposited by SFD. Reaction conditions: 310 °C, 90 bar, 0.15 wt. % Ru(tmhd)2cod, 0.6 wt. % hydrogen, 5 minute heating....................................32 2.11: Field Emission Scanning Electron Microscope cross section image of a 77 nm thick ruthenium film deposited by SFD. Reaction conditions: 260 °C, 145 bar, 0.09 wt. % Ru(tmhd)2cod, 0.3 wt. % hydrogen, 3 minute heating......................33 2.12: Atomic Force Microscopy height data indicating mean surface roughness of 1nm. Reaction conditions: 260 °C, 145 bar, 0.09 wt. % Ru(tmhd)2cod, 0.3 wt. % hydrogen, 3 minute heating .................................................................................33 2.13: Temperature dependence of Ru(tmhd)2cod by the Arrhenius law for the supercritical fluid deposition of ruthenium thin films from carbon dioxide. Reaction conditions: 240 °C to 280 °C in 10 °C steps, 172 bar, 0.07 wt. % Ru(tmhd)2cod, 0.3 wt. % hydrogen, 3 minutes heating. Apparent activation energy is 45.3 kJ/mol...........................................................................................35 2.14: Growth rate dependence upon Ru(tmhd)2cod concentration. Reaction conditions: 260 °C and 280 °C, 172 bar, 0.3 wt. % hydrogen, 3 minutes heating. Using differential kinetics (inset), zero order kinetics is observed at high precursor concentration and first order kinetics at lower precursor concentration .............36 2.15: Growth rate dependence upon reaction pressure. Reaction conditions: 260 °C, 135 bar to 200 bar, 0.09 wt. % Ru(tmhd)2cod, 0.3 wt. % hydrogen, 3 minutes heating. Pressure does not influence growth rate over the range of 135 bar to 200 bar .................................................................................................................37 2.16: Growth rate dependence upon hydrogen concentration. Reaction conditions: 260 °C, 0.09 wt. % Ru(tmhd)2cod, 0 wt. % - 0.6 wt. % hydrogen, 3 minutes heating. Using differential kinetics (inset), zero order kinetics is observed at high hydrogen concentration and 2nd order kinetics at lower concentrations. Parasitic deposition is noted at 0.1 wt. % hydrogen and lower..........................................39 2.17: Example of a foiled ruthenium film due to increased stress in the film. Reaction conditions: 260 °C, 172 bar, 0.09 wt. % Ru(tmhd)2cod, 0.6 wt. % hydrogen, 3 minutes heating....................................................................................................40 xviiPDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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