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Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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Chapter 4 focuses on a wide variety of applications that benefit from the use of SFD. The co-deposition of cobalt and platinum onto TaN capped silicon wafers using bis(cyclopentadienyls) cobalt (II), CoCp2, as the cobalt source and dimethyl(1,5- cyclooctadiene) platinum (II), Pt(Me)2cod, as the platinum source is demonstrated. The catalytically enhanced deposition of ceria and platinum from tetrakis(2,2,6,6-tetramethyl- 3,5-heptanedionato) cerium (IV), Ce(tmhd)4, and Pt(Me)2cod, respectively, is reported. Attempts at the modification of a process used to fabricate BaTiO3 powders is undertaken in order to fabricate high k dielectric films from barium isopropoxide (Baip) and titanium isopropoxide (Ttip). Simultaneous deposition of nickel and neodymium films are deposited by the hydrogen assisted reduction of tris(2,2,6,6-tetramethyl-3,5- heptanedionato) neodymium (III), Nd(tmhd)3, and bis(2,2,6,6-tetramethyl-3,5- heptanedionato) nickel (II), Ni(tmhd)2, via SFD for solid oxide fuel cell cathodes. Finally, the deposition of mutli-layer stacks of Ru/TiO2/Ru and Ru/HfO2/Ru from Ru(tmhd)2cod, di(isopropoxide)bis(2,2,6,6-tetramethyl-3,5-heptanedionato) titanium (IV), Ti(tmhd)2(iPr)2 and tetra(2,2,6,6-tetramethyl-3,5-heptanedionato)hafnium, Hf(tmhd)4.is performed in order to fabricate capacitor devices on the nano scale. Chapter 5 focuses on the union of two unique technologies, plasma spray and rapid expansion of supercritical solutions, to create a new technology called plasma- enhanced rapid expansion of supercritical solvents, labeled PRESS. Highly dendritic columnar structures are deposited using Ttip PRESS. Samples have an ideal structure for high surface area electron carriers in photovoltaic cells. Chapter 6 is a summary of all the conclusions of this dissertation as well a discussion on the suggested future works. 3

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