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Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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1.2 Motivation In the world of microelectronics, miniaturization is a key issue.1 In 1965, co- founder and former CEO of Intel, Gordon Moore, authored an article predicting the growth of transistors on integrated circuits.2 Moore’s Law states that the number of transistors on a microprocessor die would double every 18 months. The prediction held true for many years after which it deviated slightly. The current trend shows the number of transistors on a die doubling approximately every 24 months, Figure 1.1.3 Figure 1.1: Moore’s Law states that the number of transistors per die will double every 18 months. The actual doubling has held relatively close to this prediction being every 24 months. In order to meet the demands of miniaturizing electronic devices, new technologies have been developed over the years. As we approach the newest levels of miniaturization, such as the 45 and 32 nm nodes, current technologies are reaching a 4

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