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Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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Figure 1.3: Surface tension of various solvents as a function of temperature. The choice of supercritical carbon dioxide as a solvent for the SFD system is the result of many considerations. It has an easily attainable critical point as well as zero surface tension at its critical point and above. It also has a highly tunable density32, Figure 1.4, which allows for much higher precursor concentrations than are possible with CVD. This is an enabling feature of SFD that changes the deposition from a mass transfer limited regime to a reaction rate limited regime. This means that the reaction can proceed at the same speed across the entire surface of the substrate, resulting in conformal film growth at relatively fast growth rates. Carbon dioxide is non toxic, inert and very cheap.33 For all of these reasons, carbon dioxide is the solvent of choice for the SFD process. 12

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