Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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(5) R.-s. Chen, Y.-s. Huang, Y.-l. Chen, Y. Chi, Thin Solid Films 2002, 413, 85-91. (6) F. Frohlich, D. Machajdik, V. Cambel, J. Fedor, A. Pisch, J. Lindner, Journal of Physics IV France 2001, 11, Pr3-325 - Pr323-332. (7) J. Goswami, W. Noh, S. K. Dey, Chemical Vapor Deposition 2005, 11, 94-98. (8) P. Hones, F. Levy, T. Gerfin, M. Gratzel, Chemical Vapor Deposition 2000, 6, 193- 198. (9) D.-H. Kim, R. H. Wentorf, W. N. Gill, Journal of the Electrochemical Society 1993, 140, 3267-3272. (10) A. Schneider, N. Popovska, F. Holzmann, H. Gerhard, C. Topf, U. Zenneck, Chemical Vapor Deposition 2005, 11, 99-105. (11) F. Papadatos, S. Consiglio, S. Skordas, E. T. Eisenbraun, A. E. Kaloyeros, J. Peck, D. Thompson, C. Hoover, Journal of Materials Research 2004, 19, 2947-2955. (12) R. Koelliker, G. Bor, Inorganic Chemistry 1991, 30, 2236-2237. (13) J. M. Blackburn, A. Cabanas, D. P. Long, J. J. Watkins, Abstracts of Papers of the American Chemical Society 2002, 223, U663-U664. (14) J. M. Blackburn, D. P. Long, A. Cabanas, J. J. Watkins, Science 2001, 294, 141- 145. (15) J. M. Blackburn, D. P. Long, J. J. Watkins, Chemistry of Materials 2000, 12, 2625- 2631. (16) A. Cabanas, J. M. Blackburn, J. J. Watkins, Microelectronic Engineering 2002, 64, 53-61. (17) A. Cabanas, D. P. Long, J. J. Watkins, Chemistry of Materials 2004, 16, 2028-2033. (18) A. Cabanas, X. Shan, J. J. Watkins, Chemistry of Materials 2003, 15, 2910-2916. (19) E. T. Hunde, J. J. Watkins, Chemistry of Materials 2004, 16, 498-503. (20) E. Kondoh, Japanease Journal of Applied Physics 2005, 44, 5799-5802. (21) E. Kondoh, K. Shigama, Thin Solid Films 2005, 491, 228-234. (22) D. P. Long, J. M. Blackburn, J. J. Watkins, Advanced Materials 2000, 12, 913-915. 16

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