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process and thus confirmation that SFD provides access to growth kinetics that are zero order in precursor concentration. Recently, Zong, et al., reported the kinetics and reaction mechanism of copper SFD via the hydrogen assisted reduction of bis(2,2,7- trimethyloctane-3,5-dionato)copper(II), Cu(tmod)2, and proposed a Langmuir- Hinshelwood rate expression for the reaction.46 This was the first time the kinetics of an SFD process was studied. Cu SFD using this precursor was found to be mechanistically similar to the CVD process and was modeled accordingly. However, Zong found that unlike in CVD, the high precursor concentration accessible in SFD yielded surface reaction rate limited, zero-order deposition kinetics with respect to precursor over broad ranges of precursor concentrations. Here is presented a comprehensive study of ruthenium SFD kinetics via the hydrogen assisted reduction of bis(2,2,6,6-tetramethyl- heptane-3,5-dionato)(1,5-cyclooctadiene)ruthenium(II), Ru(tmhd)2cod and find similar results for access to zero order deposition rates at elevated precursor concentrations that are presumably surface-reaction rate limited. 2.2 Experimental 2.2.1 Equipment 2.2.1.1 Differential Kinetics Cold Wall Batch Reactor The kinetics study is performed in a differential kinetics cold wall batch reactor, Figure 2.1, comprised of two opposed 316 stainless steel flanges sealed with a 2-236 buna-N o-ring. A cylindrical (r = 10 mm) aluminum stage heated by three 1” long, 120 V, 100 W cartridge heaters (Omega Engineering, Inc., Stamford, CT) is used to quickly attain the desired reaction temperature. The wall of the stainless steel reactor is heated 20PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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