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using four 3” long, 120 V, 170 W cartridge heaters and is maintained at a lower temperature than the reaction stage in order to induce selective deposition to the higher temperature sample stage. The reaction is performed in a batch process and precursor conversion never exceeds 15 % conversion, which allows for use of the differential method of rate analysis for the kinetics study. Figure 2.1: Custom built 316 stainless steel differential kinetics cold wall batch reactor with aluminum sample stage. 2.2.1.2 HPLC Sample Loop A microelectronic actuated, six-loop, multi position, high pressure, UW type configuration Valco Valve (Vici Valco Instruments Company Inc., Houston, TX), Figure 2.2, made of Nitronic 60 is used to collect samples in situ. The UW type rotor used for multi positioning is made of Valcon E which allows for the high temperature, high pressure sampling. Sample loops sizes range from 0.2 mL to 10 mL. The entire system 21PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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