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Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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the collected sample reaches the temperature of the HPLC sample loop in the 5 seconds used to collect the sample thereby confirming that 5 seconds is a sufficient amount of time to collect a single sample. 2.2.2 Materials Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclooctadiene)ruthenium(II), 99 %, (99.9 % Ru), Ru(tmhd)2cod, [329735-79-7], Figure 2.3, is obtained from Strem Chemicals, Inc. (Newburyport, MA) and is ground using a mortar and pestle and used without any further purification. Approximately 98 % pure n-heptane [142-82-5] (Fisher Scientific, Pittsburgh, PA) is used as received without any further purification. Coleman grade (99.99 %) carbon dioxide, ultra high purity (99.999 %) hydrogen and prepurified grade (99.998 %) nitrogen are used as received (Merriam Graves Corp, Charlestown, NH). A buna-N o-ring, size 2-236, is used for the high pressure and high temperature reactor seal (Marco Rubber and Plastic Products, Inc., North Andover, MA). Films are deposited on silicon (crystal orientation <100>, 500 nm thermally grown oxide, 1-100 micro-ohm centimeter, 750 micron total thickness) (Novellus, San Jose, CA). 23

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