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2.3 Results and Discussion 2.3.1 Film Quality High quality ruthenium films are deposited in this study. The purity of the films is determined using x-ray photoelectron spectroscopy (XPS). Figure 2.7 shows an XPS sputter depth profile of an 83 nm thick ruthenium film deposited by the hydrogen assisted reduction of Ru(tmhd)2cod from a 0.09 wt. % solution of precursor in CO2 at a stage temperature of 260 oC in the presence of excess hydrogen. No significant contamination is observed throughout the bulk of the film. Although carbon concentration is not determined directly from the C1s peak due to overlapping of its orbital energy position with that of the Ru 3d orbital, it is possible to determine if carbon impurities are present. The peak separation between the Ru 3d3/2 and 3d5/2 peak is known to be 4.2 eV in pure Ruthenium. 49-53 Additionally, the peak height ratio is known to be approximately 1.5. Convolution of the Ru peaks with the C1s peaks would be expected to alter these relationships. Figure 2.8 shows an XPS survey spectrum with enlarged, Figure 2.9, Ru 3d binding energy fingerprint region. The observed results reflect these expectations indicating a high purity ruthenium film. 28PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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