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4.5 4 3.5 3 2.5 2 1.5 1 0.5 0 0.0018 0.00182 0.00184 Ea = 45.3 kJ/mol 0.00186 0.00188 0.0019 1/T (1/K) 0.00192 0.00194 0.00196 Figure 2.13: Temperature dependence of Ru(tmhd)2cod by the Arrhenius law for the supercritical fluid deposition of ruthenium thin films from carbon dioxide. Reaction conditions: 240 °C to 280 °C in 10 °C steps, 172 bar, 0.07 wt. % Ru(tmhd)2cod, 0.3 wt. % hydrogen, 3 minutes heating. Apparent activation energy is 45.3 kJ/mol. 2.3.2.2 Precursor Concentration Dependence The growth rate dependence on precursor concentration is studied at a constant temperature of 260 °C and 280 °C (Figure 2.14). The initial reaction pressure for all reactions is 172 bar. Hydrogen concentration is also held constant for all reactions at 0.3 wt. %. At low precursor concentrations, less than 0.06 wt. %, the growth rate dependence on precursor concentration is first order. Above precursor concentrations of 0.06 wt. %, there was no increase in the growth rate with concentration, indicating zero order dependence. The zero order kinetics of the growth rate with respect to precursor concentration is an enabling feature of SFD that yields conformal film deposition over a 35 ln [Growth Rate (nm/min)]PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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