Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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broad process window. The observed zero order kinetics suggests that the rate determining step for this deposition is either the surface reaction or the desorption of byproducts from the active catalytic surface sites. 35 30 25 20 15 10 5 0 0.000 0.050 0.100 0.150 0.200 0.250 240 C 260 C 7 6 5 4 3 2 -4 -3.5 -3 -2.5 ln(C) Ru(tmhd)2cod Concentration (wt.%) Figure 2.14: Growth rate dependence upon Ru(tmhd)2cod concentration. Reaction conditions: 260 °C and 280 °C, 172 bar, 0.3 wt. % hydrogen, 3 minutes heating. Using differential kinetics (inset), zero order kinetics is observed at high precursor concentration and first order kinetics at lower precursor concentration. 2.3.2.3 Pressure Dependence Increasing pressure during SFD increases the density of supercritical carbon dioxide thereby improving its solvent strength. Increases in solvent strength in turn promotes desorption of the precursor decomposition products, which are soluble in the fluid. The effect of pressure (solvent density) on the growth rate may therefore provide 36 Growth Rate (nm/min) ln(R)

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