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insight into the rate controlling step. If the desorption of precursor is promoted, more surface sites should become available The results of the study of pressure dependence are shown in Figure 2.15. The temperature is held constant at 260 °C and the hydrogen concentration is held constant at 0.3 wt. % while the pressure is varied between 135 bar and 200 bar. For the entire range of pressures that is studied, it is found that the reaction pressure has no effect on the growth rate of the ruthenium film. The growth rate remains constant at about 27 nm/min. This result suggested that over the range of solvent strengths accessible, density mediated enhancements in the desorption of precursor decomposition products from the active surface sites did not affect the rate of film growth. 30 25 20 15 10 5 0 130 140 150 160 170 Pressure (bar) 180 190 200 Figure 2.15: Growth rate dependence upon reaction pressure. Reaction conditions: 260 °C, 135 bar to 200 bar, 0.09 wt. % Ru(tmhd)2cod, 0.3 wt. % hydrogen, 3 minutes heating. Pressure does not influence growth rate over the range of 135 bar to 200 bar. 37 Growth Rate (nm/min)PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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