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2.3.2.4 Hydrogen Concentration Dependence The effect of hydrogen concentration on the growth rate of ruthenium films is studied. The data are shown in Figure 2.16. The study is performed at a constant reaction temperature of 260 °C for 3 minutes, 172 bar and Ru(tmhd)2cod at a loading of 0.09 wt. %. At concentrations above 0.26 wt. % growth rate of the ruthenium film is independent of hydrogen concentration. It is noted that at hydrogen concentrations of 0.4 wt. % and above, the films delaminate due to increased stress in the film, Figure 2.17. At concentrations below 0.26 wt. %, the film growth rate increases with increasing hydrogen concentration. The effect of hydrogen was 2nd order with respect to ruthenium film growth rate. At concentrations of 0.1 wt. % and below, there is no deposition which is attributed to parasitic consumption of the hydrogen, possibly due to deposition on the exposed areas of the heated stage during the time that the substrate was reaching reactive conditions for film deposition. 38PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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