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* and ** represent different surface active sites available for chemisorptions. Equation 01 – 05 is the precursor adsorption to the first surface active site and ligand dissociation from the chelated metal center to the surface while equation 06 is the adsorption and dissociation of atomic hydrogen to molecular hydrogen on the second surface active site. Equation 07 – 11 is the conversion of cod to cot and their subsequent desorption. Equation 12 and 13 are film creation. Equation 14 is the rate determining step which is the surface reaction in which bound hydrogen protonates bound ligand. Equation 15 is the desorption of hydrogenated ligand back into the SCCO2. A graphical representation of the proposed mechanism is shown in Figure 2.21. SCCO2 M H H SCCO2 M H H H SCCO2 M H H MMMM MMMMM M H H H H H H M H M H M H H H H H M H H Substrate Figure 2.21: Schematic of the proposed mechanism for the deposition of ruthenium via the hydrogen assisted reduction of bis(2,2,6,6-tetramethyl-heptane-3,5- dionato)(1,5-cyclooctadiene)ruthenium(II) in supercritical carbon dioxide via the supercritical fluid deposition process. 2.4 Conclusions The kinetics of ruthenium film deposition by supercritical fluid deposition using bis(2,2,6,6-tetramethyl-heptane-3,5-dionato)(1,5-cyclooctadiene)ruthenium(II) as the 47PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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