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3.2.1.3 Four-point Bend Setup The samples were tested using a custom built four-point bending mechanical test system54, which works in displacement controlled mode with the loading continuously measured with a high-sensitivity load cell. The system also features high rigidity as well as an integration of a closed environmental cell to finely control both the relative humidity and temperature inside the cell. 3.2.2 Materials Bis(2,2,7-trimethyloctane-3,5-dionato) copper, Cu(tmod)2, is used as received without any further purification (Epichem, Inc., Allentown, PA), Figure 2. Poly(acrylic acid), PAA, [9003-01-4] (25 % solution in water, Mw ~ 90k) is diluted and used for spin coating (Polysciences, Inc., Warrington, PA). Acrylic acid [79-10-7] is used as received without further purification (Sigma-Aldrich Co., St. Louis, MO). EPO-TEK 353ND is used as received (Epoxy Technology, Billerica, MA). Approximately 98 % pure n- heptane [142-82-5 ] (Fisher Scientific, Pittsburgh, PA) is used as received without any further purification. Coleman grade (99.99 %) carbon dioxide and ultra high purity (99.999 %) hydrogen are used as received (Merriam Graves Corp, Charlestown, NH). A buna-N o-ring, size 2-236, is used for the high pressure and high temperature reactor seal (Marco Rubber and Plastic Products, Inc., North Andover, MA). Films are deposited on silicon wafers with 30 nm TaN deposited by CVD (crystal orientation <100>, 300 Å TaN by CVD, 1-100 micro-ohm centimeter, 750 micron total thickness). A silicon wafer (crystal orientation <100>, 500 nm thermally grown oxide, 1-100 micro-ohm centimeter, 60PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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