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750 micron total thickness) (Novellus, San Jose, CA) is used for the dummy side support of the sample stack. Figure 3.2: Chemical structure of bis(2,2,7-trimethyloctane-3,5-dionato) copper, Cu(tmod)2. 3.2.3 Procedure 3.2.3.1 Poly(acrylic acid) Pretreatment Poly(acrylic acid), PAA, is spun at 4000 rpm onto the TaN coated substrates from a 1 % solution of PAA in water to form a 15 nm thick layer. Data for PAA film thickness versus spin seed at various PAA/water concentrations was previously determined.55 Film thickness was confirmed with variable angle spectroscopic ellipsometry, VASE. 3.2.3.2 Supercritical Fluid Deposition of Copper The supercritical fluid deposition of copper onto PAA treated and untreated substrates is performed in the cold wall reactor mentioned in the previous section. The reaction is performed in a batch process and precursor conversion is near complete for 61PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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