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loops. The samples are decompressed and the precursor is recovered in a known volume of n-heptane. The resulting solutions are analyzed using UV-visible spectroscopy in order to determine precursor concentration in the fluid phase at various points in the reaction. This is used to confirm near complete conversion of precursor. The deposited films are characterized in order to obtain their thickness and purity. Thickness measurements are made with the profilometer while purity is confirmed via XPS. 3.2.3.3 Sample Preparation EPO-TEK 353ND epoxy is used to bond the copper deposited silicon substrate to a dummy silicon substrate similar to the substrate used for copper deposition. The epoxy is spun on at 7500 rpms for 45 s. and then cured at 140 oC at 8 kPa for 40 min. resulting in an epoxy layer thickness of approximately 5 microns. The sample stacks are diced into 45 mm (L) * 4.5 mm (W) * 0.73 mm (h) samples using a high-speed dicing saw. Finally, a notch is machined into the sample stack to within approximately 50 microns of the interface. The final sample stack for untreated and PAA pretreated films is shown in Figure 3 and 4, respectively. 63PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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