Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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4.2.1.1 Experimental 4.2.1.1.1 Equipment 4.2.1.1.1.1 ColdWallReactor The cold wall reactor used is previously described in detail in chapter 3. 4.2.1.1.1.2 Hot Wall Reactor Hot wall reactors are also used for the deposition of Co and Pt. A hot wall reactor varies from the previously mentioned cold wall reactor in that the entire vessel is heated and no selective deposition is obtained. The reactor used is a 25 mL, 17-4PH stainless steel Thar vessel (TharTech/TharSFC, Pittsburgh, PA) which is a “finger-tight” sealing, high pressure reactor, Figure 4.1. The reactor utilizes a polyimide cup with spring as the sealing mechanism. Under pressure, the spring is energized and pushes on the inside and outside lips of the polyimide cup which in turn forms a seal with the finger-tightened cap and the inside wall of the reactor. Band Heater High Pressure Seal Outlet Precursor Sample Intlet Wall Temperature Control Figure 4.1: Schematic of hot wall reaction vessel. 80

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