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Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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4.2.1.1.2 Materials Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)cobalt (III), 99 % (99.9+ % - Co), Co(tmhd)3, [14877-41-9], bis(cyclopentadienyls)cobalt (II), 98 %, cobaltocene, CoCp2, [1277-43-6], and dimethyl(1,5-cyclooctadiene)platinum (II), 99 %, Pt(Me)2cod, [12266- 92-1] are used as received without any further purification (Strem Chemicals, Inc., Newburyport, MA), Figure 4.2. Coleman grade (99.99 %) carbon dioxide, ultra high purity (99.999 %) hydrogen and prepurified grade (99.998 %) nitrogen are used as received (Merriam Graves Corp, Charlestown, NH). A buna-N o-ring, size 2-236, is used for the high pressure and high temperature cold wall reactor seal (Marco Rubber and Plastic Products, Inc., North Andover, MA). A thin (0.001”) 3.25” by 3.25” polyamide Kapton film is cut to size and used for lining the inside of the hot wall reactors (McMaster-Carr, Atlanta, GA). Films are deposited on silicon wafers with 30 nm TaN deposited by CVD(crystal orientation <100>, 300 Å TaN by CVD, 1-100 micro-ohm centimeter, 750 micron total thickness) and silicon wafers without TaN(Novellus, San Jose, CA). OO Co Co Pt O O O O Figure 4.2: Chemical structure of tris(2,2,6,6-tetramethyl-3,5-heptanedionato)cobalt (III), Co(tmhd)3, bis(cyclopentadienyls)cobalt (II), CoCp2, and dimethyl(1,5- cyclooctadiene)platinum (II), Pt(Me)2cod. 81

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