Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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100 90 80 70 60 50 40 30 20 10 00 0.5 1 1.5 2 2.5 3 Sputter Time (min) O1s Co2p Pt4f 6x104 5 4 3 2 1 0 1000 900 800 700 600 500 Binding Energy (eV) 200 100 0 Figure 4.8: XPS sputter depth profile (top) and survey scan (bottom) of sample CoPt11 showing a pure platinum film with little surface contamination and no contamination through the bulk of the film. Deposited in a hot wall reaction vessel via SFD at 60 oC. 89 400 300 -Co3p -Pt4f7 -Pt4f5 -C1s -Co3s c/s Atomic Concentration (%) -Co2p3 -Co2p1-Co2p -Co LMM -Pt4p3 -Pt4d3 -Pt4d5

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