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ceria43 and platinum44 from SFD, it is advantageous to combine the individual processes and develop a method for deposition of CeOX/Pt matrices for DMFC electrodes. 4.2.2.1 Experimental 4.2.2.1.1 Equipment 4.2.2.1.1.1 Reactors The cold wall reactor used is previously described in detail in chapter 3. The hot wall reactor used is the Thar vessel described earlier in this chapter. 4.2.2.1.2 Materials Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)cerium (IV), 97 % (99.9 % Ce), Ce(tmhd)4, [18960-54-8] and dimethyl(1,5-cyclooctadiene)platinum (II), 99 %, Me2Pt- cod, [12266-92-1] are used as received without any further purification (Strem Chemicals, Inc., Newburyport, MA), Figure 4.9. Coleman grade (99.99 %) carbon dioxide, ultra high purity (99.999 %) hydrogen and prepurified grade (99.998 %) nitrogen are used as received (Merriam Graves Corp, Charlestown, NH). A buna-N o-ring, size 2- 236, is used for the high pressure and high temperature cold wall reactor seal (Marco Rubber and Plastic Products, Inc., North Andover, MA). A thin (0.001”) 3.25” by 3.25” polyamide Kapton film is cut to size and used for lining the inside of the hot wall reactors (McMaster-Carr, Atlanta, GA). Films are deposited on silicon wafers with 30 nm TaN deposited by CVD(crystal orientation <100>, 300 Å TaN by CVD, 1-100 micro-ohm centimeter, 750 micron total thickness) and carbon glass and carbon substrates which are prepared at the University of Puerto Rico – Rio Piedras campus, Cabrera group. 92PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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