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4.2.2.2 Results and Discussion Results for the co-deposition of ceria (cerium oxide, CeOx) and platinum from Ce(tmhd)4 and Pt(Me)2cod are presented. Both a cold wall and a hot wall reactor are used to conduct these experiments. For initial film deposition, TaN capped Si wafers are used as the deposition substrate, labeled TaN in Table 4.2. Experiments are performed in the hot wall reactor at a temperature of 60 oC. The hot wall vessel is heated to 150 oC prior to the deposition so that precursor can dissolve quicker into the supercritical carbon dioxide. The reactor is allowed to cool back to 60 oC before the reaction is initiated with hydrogen. An FE-SEM image of a Ce/Pt co-deposited film is shown in Figure 4.10. Figure 4.11 is an XPS sputter depth profile showing a 1:1::Ce:Pt ratio at the surface. XRD further confirms the presence of Ce and Pt and also indicates the crystallinity of the Ce to be Ce2O3, <102> and <212>, and <200> for the platinum, Figure 4.12. The 2*theta values for Pt and Ce2O3 are very similar and therefore peak determination is based on peak intensity values. This observation is consistent with XPS results. 95PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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