Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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Table 4.2: Table of reaction conditions for each deposition, including subsequent depositions on the same sample, for samples TaN 01 – TaN 13 and samples C01 – C18. Sample Reactor TaN 01 Hot TaN 02 Hot TaN 03 Hot TaN 04 Hot TaN 05 Hot TaN 06 Hot TaN 07 Hot TaN 08 Hot TaN 09 Hot TaN 10 Hot TaN 11 Hot TaN 12 Hot TaN 13 Hot C01 Hot C02 Hot C03 Cold C06 Hot C07 Cold C08 Hot C09 Cold C10 Hot C11 Hot C12 Hot C13 Hot C14 Hot C15 Hot C16 Cold C17 Hot C18 Hot Sample Reactor C 10 Hot C 18 Hot Ce(tmhd)4 wt. % 0.654 0.616 0.637 0.613 0.064 0.639 0.640 0.639 0.643 1.271 0.326 0.000 0.645 0.646 0.646 0.162 0.652 0.286 0.000 0.163 0.000 0.341 1.287 0.000 0.000 0.000 0.157 0.000 0.000 Ce(tmhd)4 wt. % 0.000 0.000 Deposition 1 Pt(Me)2cod wt. % 0.241 0.266 0.244 0.268 1.471 0.277 0.290 0.231 0.216 0.217 0.218 0.229 0.225 0.221 0.227 0.058 0.240 0.000 0.241 0.000 0.232 0.221 0.221 0.244 0.242 0.242 0.000 0.244 0.223 Deposition 3 Pt(Me)2cod wt. % 0.227 0.244 Ce:Pt::1:X molar ratio 1.035 0.883 0.994 0.874 0.017 0.880 0.843 1.057 1.134 2.231 0.569 N/A 1.093 1.115 1.087 1.073 1.038 N/A N/A N/A N/A 0.589 2.218 N/A N/A N/A N/A N/A N/A Ce:Pt::1:X molar ratio N/A N/A H2 wt. % 0.685 0.855 0.430 0.771 0.596 0.000 0.000 0.856 0.515 0.512 0.517 0.604 0.515 0.515 0.344 0.454 0.855 0.000 0.604 0.000 0.604 0.431 0.427 0.604 0.518 0.518 0.000 0.432 1.032 H2 wt. % 1.032 0.432 Reactor Ce(tmhd)4 wt. % Deposition 2 Pt(Me)2cod wt. % Ce:Pt::1:X molar ratio H2 wt. % Hot Hot Hot Hot Cold Hot Cold Cold Reactor 0.649 0.652 0.629 0.635 0.163 0.000 0.167 0.157 0.000 0.240 0.221 0.234 0.000 0.223 0.062 0.000 Deposition 4 Pt(Me)2cod N/A 1.038 1.086 1.035 N/A N/A 1.029 N/A Ce:Pt::1:X 0.000 0.855 0.686 0.515 0.000 1.032 0.238 0.000 Ce(tmhd)4 wt. % H2 wt. % wt. % Cold 0.158 0.000 N/A 0.000 molar ratio Cold 0.155 0.000 N/A 0.000 96

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