Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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Intensity (counts) 10000 6400 3600 1600 400 0 Ce2O3 Pt <102><111> Control Control Pt Ce2O3 <200> <110> Pt Ce2O3 <311> <212> Pt <222> 20 30 40 50 60 70 80 90 100 110 2Theta (°) Figure 4.12: XRD pattern that confirms the presence of Ce and Pt on sample TaN11. The Ce peaks correspond to Ce2O3, <102> and <212> while the platinum peaks correspond to <200>. Ce and Pt deposited in a hot wall reaction vessel via SFD at 150 oC. An interesting result is the deposition of ceria at the reduced temperature of 60 oC as opposed to the typical deposition temperature of 300 oC.43 It is proposed that the platinum is acting as a catalyst which is enhancing the deposition of the ceria to the surface. In a similar finding, Puddephatt et al. reports the use of palladium catalysts to reduce the CVD deposition temperature of cerium oxide from various Ce(CF3COCHCOCF3), Ce(hfac)3, compounds from 450 oC to 250 oC.49 He also reports the catalyst-enhanced CVD of yttrium oxide from Y(tmhd)3 at temperatures as low as 315 oC from temperatures as high as 500 oC.55 Having successfully deposited CeOx and Pt simultaneously in a dispersed matrix on TaN capped Si, applications were identified that would benefit from this process. A collaboration with the Cabrera group at the University of Puerto Rico- Rio Piedras campus (UPR) was initiated in an attempt to fabricate alternative DMFC electrodes. The 98

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