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4.2.3.1.2 Materials Barium isopropoxide, Baip, [24363-37-9] and titanium (IV) isopropoxide, 98 %, Ttip, [546-68-9] are used as received without any further purification (Strem Chemicals, Inc., Newburyport, MA), Figure 4.17. Prepurified grade (99.998 %) nitrogen is used as received (Merriam Graves Corp, Charlestown, NH). A viton o-ring, size 2-236, is used for the high pressure and high temperature cold wall reactor seal (Marco Rubber and Plastic Products, Inc., North Andover, MA). Films are deposited on silicon (crystal orientation <100>, 500 nm thermally grown oxide, 1-100 micro-ohm centimeter, 750 micron total thickness) (Novellus, San Jose, CA). O O Ba O O Ti O O Figure 4.17: Chemical structure of barium isopropoxide, Baip, and titanium (IV) isopropoxide, Ttip. 4.2.3.1.3 Procedure The procedure used here is adopted from Aymonier et al. for powder formation and modified to adapt to the cold wall reactor system for film formation. The solvent system used is an H2O/EtOH mixture. EtOH is used since the selected precursors are stabilized in the solution. H2O plays a critical role in the crystallization of high purity BaTiO3. The thermodynamic phase behavior of EtOH82-86 and H20/EtOH87-98 is found in the literature. 106PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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