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4.2.4.1 Experimental 4.2.4.1.1 Equipment 4.2.4.1.1.1 Reactor The cold wall reactor used is previously described in detail in chapter 3. 4.2.4.1.2 Materials Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)neodymium (III), 99 % (99.9 % Nd), Nd(tmhd)3, [15492-47-4], bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel (II), 98 % (99.9 % Ni), Ni(tmhd)2, [41749-92-2], tris(cyclopentadienyls)neodymium, 99 % (99.9 % Nd), NdCp3, [1273-98-9], and bis(cyclopentadienyls)nickel, 99%, NiCp2 or nickelocene, [1271-039-0] are used as received without any further purification (Strem Chemicals, Inc., Newburyport, MA), Figure 4.20. Coleman grade (99.99 %) carbon dioxide, ultra high purity (99.999 %) hydrogen and prepurified grade (99.998 %) nitrogen are used as received (Merriam Graves Corp, Charlestown, NH). A buna-N o-ring, size 2-236, is used for the high pressure and high temperature cold wall reactor seal (Marco Rubber and Plastic Products, Inc., North Andover, MA). Films are deposited on 2” silicon disks (crystal orientation <100>, native oxide, 1-100 micro-ohm centimeter) (Wafer World Inc., West Palm Beach, FL). 113PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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