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The deposited films are characterized in order to obtain their purity, crystallinity and composition. Film purity and composition is determined by XPS (Nd108, Ni22, 25, 101, 109-112). Crystallinity is determined by XRD. 4.2.4.2 Results and Discussion The results and discussion for initial experimentation on the co-deposition of neodymium and nickel from Ni(tmhd)2 and Nd(tmhd)3 in supercritical carbon dioxide are presented. The precursors are chosen due to the temperatures at which they melt and decompose, Table 4.5. As seen with the ruthenium precursor presented in Chapter 2, dissolution rate increased with increasing temperature. This is because dissolution into CO2 is quicker from a liquid than from a crystalline solid. Given the decomposition temperatures, the “sweet spot” for SFD reaction temperature is between 225 oC and 270 oC. The temperature range that was studied is between 265 oC to 300 oC in order to evaluate deposition at both optimum precursor conditions and reactor limits. The concentration range studied for both Nd and Ni is 0.1 wt. % to 0.2 wt. %. Hydrogen concentration is constant at 0.5 wt. %. Deposition at both 265 oC and 300 oC yields high purity nickel films with trace amounts of neodymium. Figure 4.21 is an XPS survey scan of the Nd/Ni film deposited at 265 oC. Ni 3p and 2p peaks are strong while Ni 3d peaks are relatively weak. Figure 4.22 shows the enlarged XPS survey scan for the Ni and Nd finger print regions, which show strong signals for their respective orbitals. Figure 4.23 is an XPS sputter depth profile showing the high purity nickel film with relatively little to no neodymium. 115PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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