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Table 4.5: Melting points and decomposition points for precursors used in Nd/Ni co- depositions experiments. Precursor Ni(tmhd)2 Nd(tmhd)3 Tm Td 223-225 300+ 209-212 270 4 x 104 3.5 3 2.5 2 1.5 1 0.5 0 1100 1000 900 800 700 Binding Energy (eV) -C1s -Ni3p -O1s -Ni LMM -Ni LMM c/s -Nd3d5 -Ni2p3 600 500 400 300 200 100 0 Figure 4.21: XPS survey scan of an Nd/Ni co-deposited film. Ni 3p and 2p peaks are strong while Ni 3d peaks are relatively weak. Reactions conditions: cold wall reactor, T = 265 oC, 193 bar, 0.214 Ni(tmhd)2 wt. %, 0.211 Nd(tmhd)3 wt. %, 0.432 hydrogen wt. % and 30 min reaction time. 116PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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