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purity (99.999 %) hydrogen and prepurified grade (99.998 %) nitrogen are used as received (Merriam Graves Corp, Charlestown, NH). A buna-N o-ring, size 2-236, is used for the high pressure and high temperature cold wall reactor seal (Marco Rubber and Plastic Products, Inc., North Andover, MA). Films are deposited on 2” silicon disks (crystal orientation <100>, native oxide, 1-100 micro-ohm centimeter) (Wafer World Inc., West Palm Beach, FL). OO OO OO O Ti O Hf OO OO OO Figure 4.24: Chemical structure of di(isopropoxide)bis(2,2,6,6-tetramethyl-3,5- heptanedionato) titanium (IV), Ti(tmhd)2(iPr)2 and tetra(2,2,6,6-tetramethyl-3,5- heptanedionato)hafnium, Hf(tmhd)4. 4.3.1.3 Procedure For a typical reaction, a 2” <100> silicon wafer is mounted to the aluminum heated stage and secured with clips. A known amount of precursor is loaded into the vessel. A ceramic mask is placed over the wafer in order to set the deposition size of the layer. The vessel is sealed and placed behind protective polycarbonate housing. Then, using a constant flow of nitrogen, the reaction vessel is purged continuously over a 30 minute period. Simultaneously, the reactor wall and stage are then heated to the desired preheating temperature. Carbon dioxide is introduced into the reactor using a computer- controlled syringe pump. The reactor is then heated and maintained at a higher 120PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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