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100 90 80 70 60 50 40 30 20 10 00 20 40 60 80 100 120 Sputter Time (min) Figure 4.28: XPS sputter depth profile of a Ru/HfO2/Ru stack confirming all components of the stack. Well defined stack layers are noted. Ru3d O1s Hf4f Si2p Figure 4.29: FE-SEM image of a Ru/HfO2/Ru stack. Stack interfaces are visible and labeled (left). Image showing conformal deposition of the Ru/HfO2/Ru across the complex substrate surface. 126 Atomic Concentration (%)PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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