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Figure 4.30: Top-down image of a Ru/HfO2/Ru stack after all depositions are completed. Ru/HfO2/Ru sample stacks are tested for capacitance using a Fluke 112 multimeter. Thickness and capacitance measurements are reported in Table 4.8. Table 4.8: Thickness and Capacitance Data for Ru/HfO2/Ru Sample Stacks Top Middle Bottom Ru HfO2 Ru Sample nm nm nm μF A 33 114 32 75 B 135 40 25 381 C 112 38 23 163 4.3.3 Conclusions The fabrication of mutli-layer stacks of Ru/TiO2/Ru and Ru/HfO2/Ru on silicon substrates via SFD is reported. The Ru/TiO2/Ru stack shows decreased definition at interfaces with each additional heat cycle. It is proposed that the ruthenium is catalyzing the deposition of titania and the increased amount of ruthenium on closed corners of the Capacitance 127PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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