Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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supercritical state to atmospheric pressure which causes the dissolved material to precipitate out of solution via nucleation. The crystallized material encapsulates the supercritical solvent, which returns back to its STP state, in this case, a liquid. This causes the small crystal to break, from the inside out, which reduces particle size even further. Finally, additional particle size reduction occurs with the velocity and frequency at which the expanding particles collide with one another. The process typically generates particles on the nanometer scale. 5.1.1.2 Plasma Enhanced Rapid Expansion of Supercritical Solutions The union of both RESS and plasma spray technology is used to create a powerful technique which is called plasma-enhanced rapid expansion of supercritical solution (PRESS). PRESS allows for the deposition of high surface area materials which are formed from highly dendritic metal oxides which in turn allow for fabrication of advanced material devices, such as photovoltaic cells. The new process linearly combines the RESS system which subsequently outputs into a plasma spray process. The individual advantage of each system coupled together in this new process enables the manipulation of materials in ways that have not been realized before. The PRESS system is a serendipitous discovery whose original setup was designed for the economic and efficient deposition of thick, dense metal oxide films. However, upon initial experimentation, it was quickly realized that the resultant films are more suited for applications in photovoltaics, which benefit from thick and high surface area films of metal oxides. 142

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