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The process has also evolved over time until it reached its current form. The initial apparatus is setup as detailed in Figure 5.1. Solid or liquid precursor is stored in a high pressure vessel which is plugged on both ends with glass wool and then sealed. The pressure vessel is heated with band heaters to the desired temperature and then the solvent, carbon dioxide, is introduced to the system. Then, a soaking period, which allows the precursor to dissolve into the solvent, occurs. The vessel is put in line with a high pressure ISCO pump before and a metering valve after which subsequently outputs to the plasma flame. The pressure of the system is maintained by the ISCO pump and the flow rate is controlled by the metering valve. As the solvent with dissolved precursor reaches the end of the system, it quickly expands at supersonic speeds and instantaneously vaporizes forming a fine mist, the essence of RESS. This mist then goes directly into the high temperature plasma flame where it quickly undergoes a decomposition of the precursor. The desired products are then quickly oxidized and/or crystallized, depending on the precursor, and deposited on a substrate in a pathway directly in front of the plasma spray. The resulting films in this process had no long or short range order and do not yield thick films. 143PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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