Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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Figure 5.1: Schematic representation of the PRESS system – first design. The next evolution of this process adds a piston to the pressure vessel, Figure 5.2. Precursors are limited to liquid precursors. In this process, precursor is loaded into the pressure vessel on the downstream side of the piston. Carbon dioxide is then loaded on to the upstream side of the piston in order to avoid carbon dioxide contact with the precursor and still maintain a constant pressure on the precursor. The carbon dioxide is maintained at pressure using a high pressure ISCO pump. The process is then run in a similar manor as the initial set up. The resultant films again have no long or short range order but films are much thicker as can be seen by the results later in this chapter. 144

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