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Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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Figure 5.2: Schematic representation of the PRESS system – second design. To this point, the results have not been the desired results. In an effort to increase the atomization of the precursor which decreases particle size and would help create denser films, liquid carbon dioxide is introduced to the liquid precursor side in order to allow the carbon dioxide to dissolve into the precursor, which makes a high concentration precursor mixture. This allows the high pressure carbon dioxide to rapidly expand across the nozzle and increase atomization of the precursor prior to entering the plasma flame. In order to keep the carbon dioxide in the liquid state, no heating is used, as it was for the previous iterations of this process, for the pressure vessel. Pressure is maintained via a high pressure ISCO pump across a piston in the pressure vessel. The pressure vessel is mixed so that a homogeneous mixture is obtained. From this point, the system, Figure 5.3, is operated in the same manner as the previous designs. This final form of the 145

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