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process is now called the plasma-enhanced rapid expansion of supercritical solution which is used to fabricate films that are highly dendritic and consequently very porous with varying thicknesses of a few hundred nanometers to multiple microns simply by adjusting processing parameters. Figure 5.3: Schematic representation of the PRESS system – final design. 5.2 Experimental 5.2.1 Equipment A direct current Metco 9 MB plasma torch (Sulzer Metco, Westbury, NY) attached to a six axis robotic arm is used as the plasma source. Argon and hydrogen gas are used as the primary and secondary plasma gases, respectively. Precursors are stored in metal on metal sealed medium pressure stainless steel tubing (ID =11/16”, OD = 1”, pressure rated to 689 bar) (High Pressure Equipment Company, Erie, PA) with custom 146PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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Sulfur Deposition on Carbon Nanofibers using Supercritical CO2 Sulfur Deposition on Carbon Nanofibers using Supercritical CO2. Gamma sulfur also known as mother of pearl sulfur and nacreous sulfur... More Info
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