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Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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750 micron total thickness) (Novellus, San Jose, CA). Additionally, for electrical testing, films are deposited on square inch fluorinated tin oxide glass substrates called Tec 15 (Hartford Glass, Hartford City, IN). OO O Ti O OO O OOO O Al O O O Ti O O Zn O O OO Figure 5.4: Chemical structure of titanium (di-isopropoxide) bis(acetylacetonate), tris(2,2,6,6-tetramethyl-3-5-heptanedionato) aluminum, Al(tmhd)3, titanium(IV) 2- ethylhexoxide and zinc 2-ethylhexanoate. 5.2.3 Procedure Silicon <100> with thermally grown (500 nm) silica and Tec 15, fluorinated tin oxide glass substrates, are mounted to a stainless steel support with copper wires or bolts. The support is a stainless steel I-beam cut in half and drilled with holes used to support the substrates for deposition. The support with substrates is clamped inside of a high throughput ventilation hood. Liquid precursor and any additives are loaded into one side of a high pressure vessel with floating piston. This is done in a N2 or Ar glove box if needed. Next, supercritical carbon dioxide (T = 60 oC, P = 103 bar) is loaded from a high pressure ISCO pump into the precursor side of the high pressure vessel. The pressure vessel is not heated and the carbon dioxide returns to a liquid, although still at 103 bar. The vessel is mixed in order to create a homogeneous solution of liquid carbon dioxide dissolved into 148

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