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the liquid precursor. The pressure vessel is then mounted to the six axis robot arm. The precursor side is connected to a metering valve which outputs to a 1/16” OD stainless steel nozzle. This nozzle sprays directly into the center of the plasma flame. The system is appropriately outfitted with nozzles. The metering valve is heated with two high power density cartridge heaters controlled with a custom built microprocessor controlled temperature controller. The temperature is maintained at 70 oC. The side of the pressure vessel which does not contain the precursor, called the CO2 side, is connected to the high pressure ISCO pump. The ISCO pump operates at constant pressure, P = 103 bar. The plasma gun, argon primary and hydrogen secondary gases, is started. A standard movement routine is loaded into the robot arm that the plasma gun is directly attached to. A standard routine pass consists of seven left and seven right motions of the gun each at four mm below the previous motion. The overall vertical distance covered is 64 mm. The overall horizontal distance covered is 300 mm. Flow is controlled with the heated metering valve and read from the flow rate reading on the ISCO pump. For some runs, an IR camera is positioned so as to record temperature profiles of the substrates during deposition. After deposition, samples are allowed ample time to cool. 5.3 Results Highly dendritic metal oxides are deposited via the PRESS system. A concentration study for both titanium oxide and zinc oxide is performed. The addition of acetic acid to titanium depositions is also studied in order to explore its effects on the crystalline nature of TiO2. X-ray photoelectron spectroscopy (XPS), field emission 149PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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