Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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scanning electron microscopy (SEM), x-ray diffraction (XRD) and profilometry are used to determine composition, order, crystalline structure and thickness, respectively. 5.3.1 Titanium Dioxide 5.3.1.1 Concentration Study A concentration study of titanium (IV) isopropoxide (Ttip) as the precursor in the PRESS system is performed in order to determine the range of concentration at which highly dendritic titania films can be created. The concentration range is 10 % by volume to 100 % by volume, with the remaining volume being liquid carbon dioxide (P = 103 bar, T = 60 oC). 100 % by volume of precursor is used as the control experiment. The experiments are performed at constant pressure, P = 103 bar and constant precursor concentration. The plasma torch is maintained at a constant 2” distance from the substrate surface. At low precursor concentration, 10 vol. % Ttip, no order is seen in the deposition, Figure 5.5. 150

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