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IR data are used to evaluate the temperature of the samples immediately after deposition, Figure 5.11. It is found that, typically, after 30 passes, the temperature of the substrate never exceeds 250 oC. Figure 5.11: IR temperature profile of a typical Ttip PRESS deposition. Substrate temperature never exceeds 250 oC 5.3.1.2 Acetic Acid Study Acetic acids effect on the crystalline form of the deposited titania film is studied. The Ttip concentration is constant at 25 volume % for all the depositions. Additionally, the pressure is constant at 103 bar and the plasma torch is at a constant 2” from the substrate surface. The acetic acid is added in a molar ratio, with respect to titanium, from zero to three. At most, the total volume of the acetic acid is no more than 15 % total volume of the system. 157PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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