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The fabrication of a mutli-layer stacks of Ru/TiO2/Ru and Ru/HfO2/Ru on silicon substrates via three consecutive SFD steps is reported. It is observed that the Ru/TiO2/Ru stacks have decreased definition at the interfaces. This is a result of the heating, which is essentially an annealing step. Additionally, it is proposed that the ruthenium is catalyzing the deposition of titania and the increased amount of ruthenium on closed corners of the substrate yields local increased growth rates thereby producing unconformal deposition. Ru/HfO2/Ru stacks are also studied and show much more defined interfaces regardless of the additional thermal cycles. Additionally, all three stacks are observed to have deposited conformally across the high aspect ratio features of the substrate. 6.1.4 Plasma Enhanced Rapid Expansion of Supercritical Solutions A new process that uses both plasma spray technology and the rapid expansion of supercritical solutions is combined to form a brand new process that is called plasma- enhanced rapid expansion of supercritical solutions, labeled PRESS. The PRESS process is used to deposit a variety of metal oxides, specifically, titanium oxide and zinc oxide. Tiip is used in the PRESS system to deposit highly porous dendtritic, with cylindrical macro scale, polycrystalline rutile titania films, consisting of agglomerated sub 100 nm titania crystals. ZnEO is used in the PRESS system to deposit highly porous dendtritic zinc oxide nanostructure consisting of columnar assemblies of agglomerated zinc oxide particles of approximately 100 nm in size. These high surface area films are the first step towards making high efficiency inorganic solar cells that will be cost effective and have short fabrication times. 175PDF Image | Supercritical Fluid Deposition Of Thin Metal Films
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