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Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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copper or TaN of the presented results. Further studies can be extended to metal oxide, alloy, co-deposited and layered films. 6.2.3 Applications 6.2.3.1 Ceria/Platinum For DMFC electrodes, other oxygen buffer compounds can be used instead of the ceria. For instance, the use of ruthenium as an oxygen buffer is possible. Future work could be focused on the co-deposition of Pt and Ru matrices. 6.2.3.2 Barium Titanate The equipment limitations prevent the ability of BaTiO3 film formation from supercritical water/ethanol mixtures. Given the background that has been established for deposition from supercritical carbon dioxide, it would be advantageous to study the co- deposition of Ba and Ti from supercritical CO2. Additionally, if the water/ethanol solvent system is the desired route for Ba/Ti deposition, a new reactor system can be designed. To overcome the temperature limitations of the system, a metal on metal seal would have to be created since the o-ring seal is the limiting factor in the current reactor system. 6.2.3.3 Neodymium/Nickel Further experimentation should be performed over a larger temperature range. The temperature of the reaction should be reduced to as low as 225 oC, as long as nickel deposition still occurs. Additionally, experimentation should be extended to other precursor systems. The beta-diketonate, tmhd, ligand is known to etch surfaces during 177

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