Supercritical Fluid Deposition Of Thin Metal Films

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Supercritical Fluid Deposition Of Thin Metal Films ( supercritical-fluid-deposition-of-thin-metal-films )

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deposition and may be preventing a higher neodymium concentration during co- deposition. The cyclopentadienyl ligand has proven to be a successful ligand for precursors in SFD previously and potential precursors have been identified for future studies. Both bis(cyclopentadienyls)nickel, nickelocene, NiCp2 and tris(cyclopentadienyls)neodymium, NdCp3 should be soluble and are liquids at room temperature. 6.2.3.4 Stacks via Layered Deposition The first step towards future work for the capacitor fabrication is to electrically test the films deposited to ensure no leakage or short circuits were created. After determination of the capacitance, LCR measurements can be taken to determine the dielectric constant of the dielectric layer of the capacitor. A much higher resolution mask can be made and then used to replicate multiple capacitors on a substrate. 6.2.4 Plasma Enhanced Rapid Expansion of Supercritical Solutions Mechanical testing of the deposited films to determine their ability to withstand future steps, such as spin coating, in the microelectronic fabrication process is critical. Building a working cell to determine the efficiency is also a large area of work that has been identified for the future given the large number of cells in which this type of structure could be integrated into. 178

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